Deposition of cadmium sulphide thin films from the single-source precursor bis(diethylmonothiocarbamato)cadmium(II) by low-pressure metalorganic chemical vapour deposition

Advanced Materials for Optics and Electronics ◽

10.1002/(sici)1099-0712(199711/12)7:6<311::aid-amo321>3.0.co;2-w ◽

1997 ◽

Vol 7 (6) ◽

pp. 311-316 ◽

Author(s):

M. Chunggaze ◽

M. Azad Malik ◽

P. O'Brien

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Cadmium Sulphide ◽

Low Pressure ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Growth of FeS2 (pyrite) thin films on single crystalline substrates by low pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)00528-1 ◽

1995 ◽

Vol 146 (1-4) ◽

pp. 630-635 ◽

Author(s):

B. Thomas ◽

C. Höpfner ◽

K. Ellmer ◽

S. Fiechter ◽

H. Tributsch

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Single Crystalline ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical ◽

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Growth of epitaxial and highly oriented thin films of cadmium and cadmium zinc sulfide by low-pressure metalorganic chemical vapour deposition using diethyldithiocarbamates

Journal of Crystal Growth ◽

10.1016/0022-0248(89)90662-3 ◽

1989 ◽

Vol 96 (4) ◽

pp. 989-992 ◽

Author(s):

Dario M. Frigo ◽

Omar F.Z. Khan ◽

Paul O'Brien

Keyword(s):

Zinc Sulfide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Cadmium Zinc Sulfide ◽

Metalorganic Chemical Vapour Deposition ◽

Cadmium Zinc ◽

Metalorganic Chemical

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Effect of annealing on ZnO thin films grown on (001) silicon substrate by low-pressure metalorganic chemical vapour deposition

Semiconductor Science and Technology ◽

10.1088/0268-1242/19/6/017 ◽

2004 ◽

Vol 19 (6) ◽

pp. 755-758 ◽

Author(s):

Yuantao Zhang ◽

Guotong Du ◽

Xiaotian Yang ◽

Baijun Zhao ◽

Yan Ma ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Silicon Substrate ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Zno Thin Films ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Properties of cadmium sulphide films grown by single-source metalorganic chemical vapour deposition with dithiocarbamate precursors

Journal of Crystal Growth ◽

10.1016/0022-0248(96)00225-4 ◽

1996 ◽

Vol 167 (1-2) ◽

pp. 133-142 ◽

Author(s):

P. O'Brien ◽

J.R. Walsh ◽

I.M. Watson ◽

L. Hart ◽

S.R.P. Silva

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Cadmium Sulphide ◽

Single Source ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Preparation and properties of ZnS thin films by low-pressure metalorganic chemical vapour deposition

Journal of Materials Science ◽

10.1007/bf01151262 ◽

1993 ◽

Vol 28 (3) ◽

pp. 811-816 ◽

Author(s):

C. H. Lee ◽

C. Y. Pueng

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room-Temperature Ferromagnetism of Ga 1− x Mn x N Grown by Low-Pressure Metalorganic Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/23/5/061 ◽

2006 ◽

Vol 23 (5) ◽

pp. 1286-1288 ◽

Author(s):

Chen Zhi-Tao ◽

Su Yue-Yong ◽

Yang Zhi-Jian ◽

Zhang Yan ◽

Zhang Bin ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Room Temperature Ferromagnetism ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Rapid thermal low-pressure metalorganic chemical vapour deposition of local diffused W(Zn) contacts

Semiconductor Science and Technology ◽

10.1088/0268-1242/8/7/040 ◽

1993 ◽

Vol 8 (7) ◽

pp. 1445-1450

Author(s):

A Katz ◽

A Feingold ◽

A El-Roy ◽

N Moriya ◽

S J Pearton ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Optical and electrical quality of InGaP grown on GaAs with low pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(92)90347-l ◽

1992 ◽

Vol 125 (1-2) ◽

pp. 336-346 ◽

Author(s):

P.R. Hageman ◽

A. van Geelen ◽

W. Gabriëlse ◽

G.J. Bauhuis ◽

L.J. Giling

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Temperature-dependent Hall effect studies of ZnO thin films grown by metalorganic chemical vapour deposition

Semiconductor Science and Technology ◽

10.1088/0268-1242/23/5/055021 ◽

2008 ◽

Vol 23 (5) ◽

pp. 055021 ◽

Author(s):

K T Roro ◽

G H Kassier ◽

J K Dangbegnon ◽

S Sivaraya ◽

J E Westraadt ◽

...

Keyword(s):

Hall Effect ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Zno Thin Films ◽

Temperature Dependent ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Growth of low-resistivity high-quality ZnSe, ZnS films by low-pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(85)90110-1 ◽

1985 ◽

Vol 72 (1-2) ◽

pp. 13-16 ◽

Author(s):

A. Yoshikawa ◽

S. Yamaga ◽

K. Tanaka ◽

H. Kasai

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

High Quality ◽

Low Resistivity ◽

Metalorganic Chemical Vapour Deposition ◽

Zns Films ◽

Metalorganic Chemical

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